China is taking an important step towards achieving new breakthroughs in artificial intelligence and advanced technologies. This was reported by Zamin.uz.
According to international sources, a secret laboratory located in Shenzhen has created experimental equipment aimed at producing advanced chips necessary for artificial intelligence and modern electronic devices. This equipment is based on extreme ultraviolet lithography technology, which until now has been controlled by Western countries.
This technology is still in the testing phase, and fully functional chips have not yet been produced. However, the device has succeeded in generating the required ultraviolet light.
The Chinese government aims to produce the first chips based on this technology by 2028. However, experts emphasize that this process may extend until 2030.
The project is being implemented within the framework of China's strategic development program. State scientific centers and major technology companies are actively participating in it.
The main goal is to eliminate dependence on foreign technologies in advanced chip production and transition to operating entirely with domestic capabilities. Experts consider this initiative an important turning point on China's path to technological independence.
This process may significantly impact the global semiconductor market in the future and create a new balance in technological competition.
